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The S3000A™ System is a production worthy, high-performance transparent metrology tool for 300mm fab-wide applications.

It incorporates Rudolph's Focused Beam ellipsometry technology which was developed for demanding diffusion applications. The value-engineered S3000A is designed for transparent film applications in the litho, etch, thin films, and CMP areas.

  • Single wavelength ellipsometry and whole wafer MAControl for advanced gate metrology
  • Laser source high brightness and wavelength stability gives excellent repeatability
  • Angular resolved laser ellipsometry provides simple calibration and easy tool to tool matching
  • Focused beam ellipsometry does not require complicated dispersion models
  • The ellipsometer small site option provides capability to measure 50x50 micron measurement sites or in narrow scribe lines for advanced processes
  • Optional DUV-reflectometer provides highly repeatable measurements for 193 nm lithography processes
  • Optional Cognex PatMAX® geometric pattern recognition software provides robust performance for wafers with extreme color variation or extremely low contrast
  • Optional MAControl module for one-step, uniform, non-destructive removal of AMC layer
  • Enhanced data review mode provides improved 2D/3D mapping, data combination, measurement results review and other advanced features